RTP-3000 Advanced Rapid Thermal Processing System

RTP-3000 Advanced Rapid Thermal Processing System-shown configured for silicon wafers up to 200mm or 150mm GaAs wafers

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• Cool and process wafers simultaneously
• Wafer handling for 200mm silicon wafers or150mm GaAs wafers
• Windows-based user interface
• Touch screen control
• Dual arm robot for safe handling of wafers
• Up to six gas channels
• Temperature range: 250 deg. C - 1250 deg. C
• Atmospheric processing